American Journal of Applied Sciences

Displacement of Boron from the Silicon Crystal Nodes by Interstitial Si Atoms During Implantation and Annealing

M. Jadan, A. R. Chelyadinskii and V. Y. Yavid

DOI : 10.3844/ajassp.2005.910.913

American Journal of Applied Sciences

Volume 2, Issue 5

Pages 910-913


The process of boron displacement from the nodes into interstitial positions of interstitial Si atoms in silicon (Watkins effect) on the conditions of implantation and annealing has been investigated with the help of X-ray diffraction and electrical methods. It was revealed that the efficiency of the Watkins substitution is determined by the ion current density (level of ionization). With increasing of the ionization level in the implanted layer during implantation or annealing (additional low-energy electron irradiation) the replacement process may be suppressed


© 2005 M. Jadan, A. R. Chelyadinskii and V. Y. Yavid. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.