Research Article Open Access

Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers

Haleh Kangarlou1 and Saeid Rafizadeh1
  • 1 ,
American Journal of Applied Sciences
Volume 8 No. 8, 2011, 777-781

DOI: https://doi.org/10.3844/ajassp.2011.777.781

Submitted On: 11 May 2011 Published On: 18 July 2011

How to Cite: Kangarlou, H. & Rafizadeh, S. (2011). Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers. American Journal of Applied Sciences, 8(8), 777-781. https://doi.org/10.3844/ajassp.2011.777.781

Abstract

Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm3 sec-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.

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Keywords

  • Titanium dioxide
  • Thin films
  • AFM
  • XRD