@article {10.3844/ajassp.2011.777.781,
article_type = {journal},
title = {Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers},
author = {Kangarlou, Haleh and Rafizadeh, Saeid},
volume = {8},
year = {2011},
month = {Jul},
pages = {777-781},
doi = {10.3844/ajassp.2011.777.781},
url = {https://thescipub.com/abstract/ajassp.2011.777.781},
abstract = {Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm3 sec-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.},
journal = {American Journal of Applied Sciences},
publisher = {Science Publications}
}