Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers
Haleh Kangarlou and Saeid Rafizadeh
DOI : 10.3844/ajassp.2011.777.781
American Journal of Applied Sciences
Volume 8, Issue 8
Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm3 sec-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.
© 2011 Haleh Kangarlou and Saeid Rafizadeh. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.